|
|
Experimental Device Development |
A device formed by an array of gold nanoparticles. Photo courtesy of K. Elteto and X.M. Lin, the University of Chicago.
|
|
During device development, structures like single electron transistors (SETs), sensors, and other experimental devices often display unique properties. Characterizing these properties without damaging one-of-a-kind structures requires systems that provide tight control over sourcing to prevent device self-heating. Keithley instrumentation combines this tight control with exceptional measurement speed and sensitivity in flexible, modular architectures that make it easy to adapt to changing test requirements.
|
|
Low-level pulsed measurements involve sourcing a pulse of current and measuring the resulting voltage. Because the Model 6221/2182A combination is intended for pulse characterization at low signal levels, low-level noise issues will be of concern. However, the 6221/2182A combination differs from all previous test configurations in some important ways. One of the differences is that all of the pulse measurements are difference (or relative) measurements. This means that background voltages that would add error to the measured signal, such as offsets, drift, noise, and thermoelectric EMFs, are cancelled.
|

|
| DC offsets due to thermal voltage and meter offsets can give significant errors in the measured voltage. |
|
Offsets are cancelled using a delta-mode measuring technique.
|

|
Performing relative measurements cancels offset error. The measured delta voltage gives correct voltage response to the current pulse. |
|
A two-point delta mode measurement works by sourcing current pulses and taking one measurement before and one during each pulse. Taking the difference between these two measurements cancels out any constant thermoelectric offsets, which leaves the true value of the voltage. However, the two-point method cannot cancel thermoelectric offsets that drift over time. Using a third measuring point in the delta method cancels drifting offsets.
|

|
| An optional third measurement point can help cancel moving offsets. |
|
The third measurement is optional but it is not preferable. For instance, depending on the device timing characteristic, if the sourced current pulse has long-lasting effects on the device, the third measured point, which is intended for canceling the moving offset, may include errors due to the heat from the pulse of the DUT and, therefore, do more harm than good.
To learn more about different measurement techniques for Nanoscience, be sure and obtain our latest edition of the Nanotechology Measurement Handbook and the Low Level Measurements Handbook
|
|
|
|
 |
|
|
Test Solution |
|
Keithley Instrumentation is being used in a growing list of nanotechnology research and development settings. The applications shown here are only a sampling of the nanotechnology test and measurement tasks for which our instruments and systems are suitable. If your tests require sourcing or measuring low level signals, Keithley instrumentation can help you perform them more accurately and cost-effectively."
with the attached diagram. |
 |
For specific measurements on Nanowire, Nanotubes and other NanoMaterials, the following selector guide will direct you to the best solutions. |
 |
For specific Current versus Voltage measurements on Nanoelectronics, the following selector guide will direct you to the best solutions. |
 |
For specific measurements where pulse characterization is required to reduce Joule-Heating effects on Nanowire, Nanotubes, NanoMaterials, and Nanoelectronics, the following selector guide will direct you to the best solutions. |
 |
|
|
|
Model 4200-SCS Semiconductor Characterization System |
 |
| Features:
Conforms to IEEE 1650-2005 standard
Easy-to-use, Windows-based operation
A complete, integrated solution
Unmatched flexibility and adaptability |
|
At the heart of the nanoscience device research lab is the Model 4200 Semiconductor Characterization System. Keithley originally developed the Model 4200-SCS for the semiconductor industry, but nanotechnology researchers soon discovered its effectiveness for developing and studying nano-scale materials and devices. Today, this powerful characterization system is the industry-standard tool used in nanotechnology research and education labs around the world in applications ranging from materials research and nanostructure development to I-V characterization of nanoelectronic devices. The system's popularity is due in part to our commitment to enhancing its hardware and software to meet emerging test needs. Our ongoing commitment to the Model 4200-SCS ensures we'll continue to provide you with a cost-effective system upgrade path to new measurement capabilities.
|
|
|
|
|
|
|
|
|